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(Click for frequent words.) 76 ArF immersion 72 argon fluoride ArF 69 XLR #i 69 argon fluoride 68 KrF 68 Gigaphoton 66 deep ultraviolet DUV 66 DUV 66 immersion lithography 65 #nm immersion 64 #nm lithography [001] 64 #nm wavelength [001] 64 XT #i 63 epitaxy HVPE 63 NSR S#C 63 nm immersion 63 SOI CMOS 62 microbolometers 62 UV VIS 62 nm lithography 62 ArF immersion lithography 62 mask aligners 61 numerical aperture NA 61 Photolithography 61 photoresists 61 excimer 61 plasma etch 61 computational lithography 61 reticle inspection 61 lithography 61 TWINSCAN XT 61 Nd YAG 61 #nm ArF 61 Extreme Ultraviolet EUV 61 #.#um [001] 60 extreme ultraviolet EUV 60 ArF dry 60 VCSELs 60 wafer bonder 60 excimer lasers 60 TWINSCAN XT #i 60 SOI wafer 60 MaxBright 60 Dektak 60 #.# micron node 60 Aixtron MOCVD 60 ASML TWINSCAN 60 PHEMT 59 SIMOX 59 Installed Base Products 59 EUV 59 #nm #nm [002] 59 Gallium Arsenide 59 GaAs substrate 59 OnPulse 59 pHEMT 59 hydride vapor phase 59 #nm immersion lithography 59 epi wafers 59 SOI wafers 59 oxide semiconductor 59 GaAs substrates 59 extreme ultraviolet lithography 59 VIISta 59 extreme ultra violet 59 brightness LED 59 CMOS fabrication 59 microfocus X ray 59 ownership CoO 59 layer deposition ALD 59 laser diode modules 59 Simitri HD 59 wafer prober 59 phototransistors 58 xenon lamps 58 epitaxial silicon 58 fxP 58 crystalline Si 58 monochromators 58 Elpida #nm 58 inertial MEMS 58 mask aligner 58 Helios XP 58 poly Si 58 Fabry Perot 58 AlGaAs 58 HEMTs 58 MWIR 58 ion implanter 58 solder bump 58 scatterometry 58 AlN 58 #nm laser [002] 58 Aera2 58 EUV lithography 58 DFB lasers 58 EDXRF 58 5μm 58 epiwafers 58 aluminum nitride 58 Chemical Vapor Deposition CVD 58 SiC substrates 58 ion chromatography 58 PMOLED 58 catalytic oxidation 58 LPCVD 57 UVTP 57 magnetostrictive 57 optical metrology 57 UV LED 57 AlGaInP 57 MOCVD 57 nanoimprint 57 plasma etching 57 InGaAs 57 numerical aperture 57 EUVL 57 UV Visible 57 LiNbO3 57 microbolometer 57 ultra violet UV 57 YAG lasers 57 Si substrates 57 microlithography 57 #.#μm CMOS process 57 PIN diodes 57 TWINSCAN NXT 57 Silicon Germanium 57 Mbit SRAMs 57 Aerosol Jet 57 AIX #G# 57 immersion litho 57 CMOS RF CMOS 57 #nm laser [001] 57 Energetiq 57 DiCon 57 GaN LEDs 57 selective emitter 57 Gallium Arsenide GaAs 57 Nd YAG laser 57 epitaxial layer 57 micro machining 57 nano imprint 57 Kinsus 57 amorphous silicon Si 57 silicon etch 57 photomultipliers 57 liquid chromatograph 57 SiON 57 EUV masks 57 Indium Phosphide 57 nm wavelengths 57 sapphire substrate 57 photon detection 57 pulsed lasers 57 WS CRDS 57 GaAs MMIC 57 LTPS LCD 57 5V CMOS 57 InGaP HBT 57 ferrite core 57 aqueous dispersion 57 #nm CMOS [002] 57 photolithography 57 ion implantation 57 GaAs HBT 57 microcavity 56 laterally diffused metal 56 wavelength tunable 56 Si TFT LCD 56 Diode Laser 56 CO2 lasers 56 HEMT 56 pellicle 56 ion implanters 56 CRIUS 56 Cold Cathode Fluorescent Lamps 56 BiCMOS 56 GaN HEMT 56 CMOS MEMS 56 thermoelectric coolers 56 Gallium Nitride 56 #LP [002] 56 DPSS lasers 56 projected capacitive touch 56 W/cm2 56 cuvette 56 nm wavelength 56 Uncooled 56 nanometer silicon 56 toric lens 56 implanter 56 HBLED 56 nitriding 56 silicon MEMS 56 transmissivity 56 Co2 laser 56 ultrasonic spray 56 .# micron 56 Soitec produces 56 Planetary Reactor 56 metallisation 56 CdTe PV 56 TurboDisc K#i 56 athermal 56 #.#um CMOS 56 Vertical Cavity Surface Emitting 56 GaN LED 56 antireflective coating 56 laser micromachining 56 tunable RF 56 SpecMetrix 56 Silicon Nitride 56 Inductors 56 millisecond annealing 56 Gallium Nitride GaN 56 HTPS panels 56 Cymer 56 Insulator SOI 56 Laser Marking 56 2Gb DDR3 56 dielectric etch 56 fiber lasers 56 thermal conduction 56 SOI substrates 56 LabChip 56 ZnS 56 Nd YAG lasers 56 nm CMOS process 56 silicide 56 NanoBridge 56 HORIBA Jobin Yvon 56 TappingMode 55 Fiber Bragg Grating 55 CIGS cells 55 Simitri 55 photomasks 55 copper metallization 55 BrightLase 55 Microdisplay 55 JFET 55 Applied Baccini 55 #nm [002] 55 k gate dielectrics 55 vertical cavity 55 magnetron sputtering 55 Surface Acoustic Wave 55 APTIV film 55 MEMS oscillator 55 CMOS silicon 55 GaAs FETs 55 fiber Bragg gratings 55 optical lithography 55 High Brightness LEDs 55 FD SOI 55 triple quadrupole 55 xenon lamp 55 CMOS transistors 55 insulator substrate 55 Coriolis meters 55 nucleation layer 55 Metallization 55 wafer bonding 55 PolyMax 55 MicroPulse 55 EasyTube 55 quartz oscillators 55 electrophoretic 55 PIN diode 55 AFMs 55 coating thickness 55 GaN wafers 55 copper interconnects 55 MOS transistor 55 CdSe 55 doped silicon 55 Opti Probe 55 epitaxy 55 photoresist 55 PECVD 55 Smartlipo MPX 55 fluidised bed 55 FT IR 55 SUSS MicroTec 55 BiFET 55 microchannel plate 55 CATPRO 55 MALDI 55 Complementary Metal Oxide Semiconductor 55 Nova NanoSEM 55 VUV 55 imprint lithography 55 Electron beam 55 DualBeam 55 Chemical Vapor Deposition 55 #nm silicon 55 ultraviolet laser 55 SMD LEDs 55 GaN layers 55 WaferPro 55 Organic Chemical Vapor 55 laser diode module 55 AMLCD 55 outcoupling 55 zirconium oxide 55 indium tin oxide ITO 55 Micromorph 55 DongbuAnam 55 voltage CMOS 55 bipolar transistors 55 FEOL 55 pMOS 55 tunable laser 55 optically pumped 55 indium gallium nitride InGaN 55 LED BLUs 55 Epitaxial 55 CMP consumables 55 EMCCD 55 conformal coatings 55 pulsed fiber 55 #um [002] 55 photolithographic 55 micro optics 55 wafer thickness 55 Airborne Particle Sensor 55 C4NP 55 SMD LED 55 CIGS solar cell 55 mechanical polishing CMP 55 #.# micron CMOS 55 1μm 55 QMEMS 55 TurboDisc 55 UMC #nm 55 electrodeposition 55 antireflection 55 carbon nanotube CNT 55 TCZ 55 TSMC #nm process 55 brightfield 55 LED Illuminator 55 TFTs 55 TWINSCAN 55 UHPLC 55 Silicon CMOS Photonics 55 semiconductor lithography 55 insulator wafers 55 Abrisa Technologies 55 absorption spectroscopy 55 overlay metrology 55 CMOS imager 54 Tachyon OPC + 54 nm CMOS 54 TQP# 54 benchtop instruments 54 UV curing inks 54 AlInGaP 54 Nd Yag 54 Mask Aligner 54 nm immersion lithography 54 AlphaScreen 54 pyrolytic 54 silicon germanium SiGe 54 TECHSPEC ® 54 lamp ballasts 54 UV curable 54 infrared emitters 54 reactive ion 54 ultrasonic flowmeters 54 InGaP 54 e beam lithography 54 #.#μm [002] 54 2μm 54 VECTOR Express 54 LED BLU 54 spectroradiometers 54 LCD steppers 54 LDLS 54 Double Patterning 54 tunable filters 54 IGBT Insulated Gate 54 wafer diameters 54 BEOL 54 TrueFocus 54 UV flatbed printer 54 Indium Tin Oxide 54 ProFire Excel 54 silicon Si 54 wph 54 GaAs MESFET 54 micron wafers 54 multilayer ceramic capacitors MLCC 54 TI MSP# MCU 54 CMOS Image Sensors 54 coater developer 54 nLIGHT 54 vapor deposition 54 photoluminescence 54 UV curing 54 Amorphous Silicon 54 nano patterning 54 quantum cascade 54 MOS transistors 54 EO polymer 54 submicron 54 Thin Film Battery 54 Femtosecond 54 SpyGlass ® 54 Single Wafer 54 MOCVD reactor 54 multicrystalline silicon 54 CMOS ICs 54 FAIMS 54 femtosecond pulse 54 mask ROM 54 microdisplay 54 Arria GX FPGAs 54 wafer 54 LedEngin 54 indium gallium arsenide InGaAs 54 RFCMOS 54 AquiVia 54 backlight module 54 GentleLASE 54 AlGaInP LEDs 54 ellipsometry 54 Vapor Phase 54 PowerDI TM 54 Imprio 54 #nm CMOS [001] 54 backside illumination 54 silicon photonic 54 high voltage BCDMOS 54 furnaceware 54 Agilent B#A 54 silicon waveguide 54 photomultiplier tube 54 Control LACC 54 TDK EPC 54 optical waveguides 54 pulsed laser deposition 54 photopolymer 54 argon ion 54 laser MFPs 54 irrigated catheter 54 dielectrics 54 electroless copper 54 GaN 54 NuFlare 54 SiTime 54 Photodiode 54 cordierite 54 nanoflow 54 Sigma fxP 54 SFP + transceivers 54 Lithium Niobate 54 tunable lasers 54 BrilliantColor TM 54 CyberDisplay #K 54 photomultiplier 54 monochromator 54 Immersion Lithography 54 nMOS 54 LTPS 54 di selenide CIGS 54 inkjet printhead 54 SiC 54 CameraChip 54 #nm wavelengths 54 AlGaN 54 LTPS TFT 54 Metrology System 54 HamaTech 54 BriteLight 54 electron beam welding 54 Teradyne FLEX 54 Printheads 54 YAG laser 54 chromatographic separations 54 calcium fluoride 54 ADMP# 54 supercritical CO2 54 K dielectrics 53 AlSiC 53 lithium niobate 53 UV absorbance 53 CMOS wafers 53 SiO 2 53 High Brightness LED 53 diode LED 53 backside illumination BSI 53 germanium substrates 53 DrMOS 53 C0G 53 CCD detector 53 NDIR 53 Spraytec 53 CdTe Si 53 DPSS laser 53 intracavity 53 PeakView 53 photomultiplier tubes 53 Wafer Bonding 53 photoresist strip 53 Tetratex 53 VCXO 53 MEMS oscillators 53 EasyTube ™ 53 emission wavelength 53 solution processible 53 monolithic microwave integrated 53 DCG Systems 53 fluorescence detection 53 inkjet inks 53 CIGSe 53 ion implant 53 PEALD 53 wafer metrology 53 gas chromatographs 53 GaAs foundry 53 EG# [002] 53 Foveon X3 53 SiGe bipolar 53 nanopowders 53 OptoCooler 53 Moritex 53 3D TSV 53 TCXOs 53 #.#μ 53 passive matrix 53 LED backlit LCD TVs 53 hollow cathode 53 #G DQPSK 53 silicon CMOS 53 wafer dicing 53 embedded SerDes 53 nm diode laser 53 detector arrays 53 infrared LEDs 53 chip resistors 53 backside metallization 53 Transparent Conductive Oxide TCO 53 monocrystalline silicon 53 nitride semiconductor 53 Czochralski 53 Agilent #A [002] 53 PROLITH 53 LED printheads 53 thermally conductive 53 Mercury5e 53 reflow soldering 53 beamsplitters 53 ceramic capacitor 53 LSA#A 53 #nm node [002] 53 Automated Optical 53 Beamline #.#.# 53 #.#um [002] 53 backscattering 53 ALTUS Max 53 DSi etch 53 Alanod Solar 53 Gallium arsenide 53 Light Emitting Diodes LEDs 53 SensArray 53 HVOF 53 chemiluminescence 53 GaAs pHEMT 53 String Ribbon 53 capacitive touch panels 53 HfSiON 53 TOF TOF 53 MP# processor 53 melt viscosity 53 videoscopes 53 Apogee Photonics 53 NOxOUT 53 Flex OneNAND 53 Phoseon 53 CCD CMOS 53 metallization 53 sapphire wafers 53 helium ion 53 VECTOR Extreme 53 gate dielectrics 53 Infinity LC 53 electron optics 53 Si substrate 53 nm 53 AKT #K 53 UV NIL 53 J#Ex 53 darkfield 53 microtubes 53 poly silicon 53 PIN photodiode 53 resistive capacitive 53 Schottky Diodes 53 LDO voltage regulator 53 Aspheric 53 SiGe C 53 uncooled 53 MLC NAND flash 53 #GBASE T PHY 53 SOI substrate 53 Op Amps 53 NovaMARS 53 W mK 53 planarization 53 micromirror 53 TMS#C# DSP 53 density interconnect HDI 53 x ray optics 53 optically transparent 53 QCLs 53 PosiRx 53 epitaxial wafers 53 Interferometric 53 #nm MLC 53 Rapid prototyping 53 InP substrates 53 triplexer 53 MLCCs 53 amorphous silicon 53 MOCVD reactors 53 diode lasers 53 gallium nitride 53 cryogenically cooled 53 Printhead 53 wire bonders 53 OptiChem 53 Dual Frequency 53 GaN layer 53 Ti sapphire laser 53 CMOS sensors 53 semiconductor wafer 53 laser interferometer 53 AXi 53 Zone Sonography TM 53 thermoelectric cooling 53 Inkjet printing 53 SUSS 53 rugged conduction cooled 53 etch deposition 53 microspectrophotometer 53 transparent conductive 53 ZnSe 53 #nm RF CMOS 53 parasitic capacitance 53 ModularBCD 53 Tetra Reticle Clean 53 #W halogen 53 UV curable ink 53 polyethylene fiber 53 InGaN 53 LCD backlights 53 photodetectors 53 5kV 53 wafer thinning 53 TLA# Series 53 iCoupler 53 indium phosphide 53 Scanning Probe 53 ferrite materials 53 K2 Optronics 53 nanoimprint lithography NIL 53 Pattern Matcher 53 color laser MFPs 53 crossflow 53 multi crystalline wafers 53 polishing pads 53 ultraviolet lasers 53 μm diameter 53 ferrites 53 PowerPro MG 53 GxT 53 Kopin CyberDisplay 53 heterojunction bipolar transistor 53 AFM probes 53 UV LEDs 53 TiN 53 mask optimization SMO 53 Agilent U#A 53 Flip Chip 53 laser beam printers 53 ratiometric 53 NXT #i 53 silicon 53 glass substrate 53 Ultra Wide Angle 53 #.#u 53 Cymbet EnerChip 53 diode laser 53 MultiWave 53 HDP CVD 53 underfill 53 indium gallium phosphide InGaP 53 UVision 53 reflow ovens 53 reflectometry 53 wirebond 53 Polycrystalline 53 nanofilm 53 GaN substrates 53 silicon germanium SiGe BiCMOS 52 UV Curing 52 silicon substrates 52 Agilent #A [001] 52 nano imprint lithography 52 melt adhesives 52 SWIR cameras 52 Extreme Ultraviolet 52 passive matrix OLEDs 52 solder reflow 52 low k dielectrics 52 nanometer wavelength 52 Diode laser 52 Near Infrared 52 sputter deposition 52 multilayer ceramic capacitors 52 organic TFTs 52 conductive polymer 52 liquid chromatography LC 52 crystalline silicon wafers 52 Agilent SurePrint 52 encapsulant 52 optically coupled 52 indium phosphide InP 52 aluminum nitride AlN 52 nanometer lithography 52 OLED XL 52 MLC NAND Flash 52 BLUs 52 CRIUS II 52 laser ablation 52 #.# micron SiGe 52 Photoresist 52 packaging WLP 52 laminating adhesives 52 DEV DA TOMAR NEXT 52 Silicon wafer 52 TSV metallization 52 chemical vapor deposition 52 mono crystalline silicon 52 CMOS oscillators 52 discretes 52 thermoelectric cooler 52 Cree GaN 52 crystallinity 52 Compound Semiconductors 52 Er YAG 52 LPKF 52 ionic contamination 52 CBT resin 52 Copper Indium Gallium 52 SiC wafers 52 amplifier modules 52 Adaptive DPSK 52 SOI silicon 52 CMP slurries 52 Veeco Introduces 52 SourceMeter 52 OCXO 52 conformal coating 52 conductive coatings 52 high-k/metal gate 52 flexible monolithically integrated 52 conduction cooling 52 Silicon carbide 52 Lithography 52 Asymtek 52 additive fabrication 52 Valpey Fisher Corporation 52 RapidIO Switch 52 GX# [003] 52 quartz crystal oscillator 52 OLED microdisplays 52 bipolar transistor 52 CMOS Image Sensor 52 Optima XE 52 RSoft 52 absorbance 52 Pseudo SRAM 52 Indium phosphide 52 deep submicron CMOS 52 aspheric lenses 52 #V MOSFETs [002] 52 bandpass filters 52 nonpolar GaN 52 FotoNation FaceTracker 52 OLED microdisplay 52 conductive pastes 52 picosecond laser 52 E pHEMT 52 Gb NAND 52 Innolume 52 Cavity Ring Down 52 Nova T# 52 linewidths 52 1Gb DRAM 52 hafnium oxide 52 projected capacitive 52 active matrix OLEDs 52 Gas Chromatography 52 PVD coating 52 TSMC foundry 52 silane gas 52 Ascentis Express 52 film transistors TFTs 52 CMOS wafer 52 TFPV 52 X7R 52 MI #XM 52 laser annealing 52 Bragg grating 52 Fourier transform infrared FTIR 52 ion beam 52 CMOS IC 52 temperature polysilicon LTPS 52 InAs 52 electrochemical sensor 52 flexo plates 52 ultrashort pulse laser 52 Powerful debug 52 amine scrubbing 52 temperature calibrators 52 Rofin 52 Helium Ion Microscope 52 X ray microanalysis 52 Marvell #DE# 52 FD OCT 52 Mach Zehnder modulator 52 harmonic filters 52 OP# [002] 52 microplate reader 52 BrightStar TM 52 conformal 52 3Xnm 52 Aluminum Oxide 52 Xtrinsic 52 ferroelectric liquid crystal 52 CoO 52 CMOS processes 52 defect densities 52 produced plasma LPP 52 laser sintering 52 multiphoton 52 Parylene 52 threshold voltages 52 Lumiramic phosphor technology 52 gate electrode 52 AIXTRON MOCVD 52 regenerable 52 BGA packaging 52 PolyJet Matrix TM 52 sol gel 52 X ray detectors 52 MOCVD systems 52 k dielectric 52 MEMS microphone 52 Aixtron 52 HKMG technology 52 multijunction solar cells 52 broadly tunable 52 monocrystalline wafers 52 SMT LEDs 52 physical vapor deposition 52 #lm [002] 52 PhlatLight 52 Microdisplays 52 moisture analyzer 52 Reference Methodology 52 conductive adhesives 52 Lambda Physik 52 VisuMax 52 Aluminum Nitride 52 #.#x#.#mm 52 die bonder 52 SiC Schottky diodes 52 diode pumped 52 Pulsed Light 52 Vivid Magenta 52 CMOS logic 52 electrically insulating 52 Tunable 52 film transistor TFT 52 WinPath3 SuperLite 52 TCXO 52 QRC Extraction 52 varistor 52 scanning electron microscope SEM 52 transistor leakage 52 SWCNT 52 QWIP 52 NiSi 52 MESFET 52 ultrasonic transducers 52 CVD diamond 52 Synopsys PrimeTime 52 sapphire substrates 52 Flexar 52 transimpedance amplifier 52 SynJet 52 piezoresistive 52 #nm FPGAs 52 pulse width modulation 52 OTFT 52 MTS# 52 liquid argon 52 crystalline silicon c 52 MAX# integrates 52 mm wafer 52 monochrome laser 52 #.#μm [001] 52 bonder 52 optocoupler 52 FPDs 52 sSOI 52 CMOS circuits 52 F3D 52 Carbon nanotube 52 planar waveguide 52 Fiber Laser 52 QFN packaging 52 ENIG 52 #μm thick [002] 52 Laser MicroJet 52 RedHawk SDL 52 #mTc 52 copper nanorods 52 dielectric materials 52 BCDMOS 52 multicrystalline 52 particle sizing 52 ion microscope 52 thermally stable 52 nanolithography 52 VISIONPAD 52 polyimide 52 SiGe 52 OPTIMASS 52 TeraVicta 52 CCFL backlight 52 Schottky 52 patented etch 52 subwavelength 51 Follow Vishay 51 ReRAM 51 pyrometers 51 NOVeA 51 silicon nanocrystals 51 Cadence Encounter 51 wet granulation 51 ML#Q# 51 femtosecond lasers 51 polyetheretherketone PEEK 51 industrial inkjet printing 51 laser scribing 51 thermal oxidation 51 photocouplers 51 Thermal Processing 51 INTRINSIC 51 #mm wafer 51 oxide thickness 51 CIGS PV 51 Particulate Reactor TM 51 Thermo Scientific Accela 51 micromachining 51 reflow soldering processes 51 nanocrystalline 51 Near Infrared NIR 51 polyphenylsulfone 51 GaN transistor 51 SigmaQuad 51 Pulsed 51 Cadence Encounter RTL Compiler 51 Flowmeter 51 DDR3 modules 51 aqueous solvent 51 brightness light emitting 51 GaN substrate 51 violet laser 51 tunable optical 51 photonic crystal fibers 51 inkjet printers UV 51 picoliter droplets 51 nanosilicon 51 Clamp Meter 51 Spectrophotometers 51 Thermex 51 PlasmaBlade 51 Cadmium Telluride CdTe 51 Arima Optoelectronics 51 Coriolis flowmeter 51 DDR3 chips 51 Sofradir EC 51 silicon oxynitride 51 LUXEON H