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(Click for frequent words.) 62 epi wafers 62 electroless copper 61 metallisation 60 mechanical polishing CMP 59 ultrapure 59 vapor deposition 59 nano crystals 59 ZnS 59 sapphire substrate 58 electroless 58 photoresist stripping 58 plasma etching 58 microporous 58 microcrystalline 58 eG ViaCoat 58 magnetron sputtering 58 silicide 58 metallization 58 antireflective coatings 58 Electrografting 58 epitaxy HVPE 58 semiconductive 58 metallization pastes 57 Carbon nanotube 57 millisecond anneal 57 Czochralski 57 di selenide CIGS 57 EUV masks 57 cordierite 57 dielectric etch 57 CMOS fabrication 57 SiON 57 wafer dicing 57 mask aligner 57 solder bump 57 polymer membrane 57 optical waveguides 57 deep silicon etch 57 inorganic nanocrystals 57 photoresist strip 57 reactive ion 57 wafer bonder 57 copper metallization 57 photolithographic 57 Chemical Vapor Deposition CVD 57 CRIUS 57 electroless nickel 56 polydimethylsiloxane PDMS 56 nanofilm 56 ownership CoO 56 yttrium barium copper 56 PEALD 56 planarization 56 carbon nanotube CNT 56 UVTP 56 Powerful debug 56 Photolithography 56 electro deposition 56 ultraviolet curable 56 cadmium chloride 56 nanotube arrays 56 pulsed laser deposition 56 oxide semiconductor 56 nanoparticulate 56 nanometric 56 calcium fluoride 56 thermo mechanical 56 transparent conductive 56 inkjet printhead 56 CMOS wafer 56 Sigma fxP 56 millisecond annealing 56 Transparent Conductive Oxide TCO 56 nano composites 56 zinc oxide ZnO 56 nanoengineered 55 etch deposition 55 microstructured 55 nanoporous 55 III nitride 55 conformal 55 wafer thinning 55 cuprous oxide 55 flux residues 55 intermetallic 55 supercritical fluid 55 aluminum nitride 55 cadmium sulfide 55 nanopowder 55 particulate contamination 55 wafer metrology 55 singulation 55 AlN 55 polishing pads 55 indium gallium 55 microcavities 55 nano coating 55 copper indium diselenide 55 sol gel 55 silicon etch 55 epitaxial deposition 55 CIGS solar cells 55 P3HT 55 Gallium Arsenide GaAs 55 BiFET 55 ionization mass spectrometry 55 conductive adhesives 55 gate dielectrics 55 AlGaN 55 electrically insulating 55 immersion litho 55 rheology modifier 55 solvent evaporation 55 transparent electrode 55 solderable 55 silicon Si 55 dual damascene 54 nanopowders 54 amorphous silicon Si 54 CyberDisplay #K 54 injection moldable 54 Si substrates 54 silicon substrates 54 GaN wafers 54 copper electrochemical deposition 54 zirconium oxide 54 silane gas 54 epitaxy 54 LPCVD 54 cell culturing 54 nanocrystalline 54 VICTREX PEEK polymer 54 finely dispersed 54 nano imprint 54 #nm RF CMOS 54 thermosetting 54 biohybrid 54 microreactors 54 defect densities 54 Silicon Nitride 54 electrodeposition 54 dielectric deposition 54 anodic 54 selenide 54 UMC #nm 54 dielectric layers 54 BEOL 54 extractables 54 ceramic membranes 54 Gallium arsenide 54 Particulate Reactor TM 54 UV coatings 54 LiNbO3 54 laser annealing 54 epiwafers 54 low k dielectrics 54 high voltage BCDMOS 54 VECTOR Express 54 epitaxially grown 54 silicon dioxide SiO2 54 reaction kinetics 54 flocculants 54 mesoporous 54 plasma etch 54 overmolding 54 CMP consumables 54 SWIR cameras 54 silicate glass 54 gallium selenide 54 EMI RFI shielding 54 fused quartz 54 APTIV film 54 chalcogenide 54 PET flake 54 Cadmium Telluride CdTe 54 passivation 54 nitride semiconductor 54 nanofilms 54 macroporous 54 indium phosphide InP 54 nitrides 54 tin Sn 54 #nm silicon 54 Solamet ® 54 encapsulant 53 NiSi 53 inherently flame retardant 53 persimmon vinegar 53 thermoplastic polyester 53 SOI silicon 53 Si wafers 53 PolyJet Matrix TM 53 etchant 53 CdSe 53 #.#um CMOS process 53 sub micron 53 sputter deposition 53 #nm CMOS [002] 53 nanometer silicon 53 Ruthenium 53 reagent consumption 53 nanodiamond 53 cored wire 53 computational lithography 53 paints sealants 53 furnaceware 53 InGaN 53 gallium indium arsenide 53 K dielectrics 53 titanate 53 silicone elastomer 53 hafnium oxide 53 microreactor 53 laminating adhesives 53 emulsion PCR 53 CMP slurries 53 reverse osmosis membrane 53 elastomeric seals 53 ECPR 53 nano particle 53 2Xnm 53 copper indium gallium 53 photoresist 53 wafer uniformity 53 InnerArmor 53 conformal coatings 53 micro fluidics 53 crystalline silicon photovoltaic 53 AlGaAs 53 zero valent iron 53 epitaxial wafers 53 adhesive sealant 53 extruded profiles 53 conductivities 53 TSV metallization 53 multijunction solar cells 53 nanotubes nanowires 53 monolithically integrated 53 ZnSe 53 biologically inert 53 solubilizing 53 polymer emulsion 53 thermosetting resins 53 slurries 53 solder bumping 53 solder spheres 53 lithographic processes 53 pellicle 53 nanostructured silicon 53 rigid foams 53 AquiVia 53 oxide nanoparticles 53 silanes 53 lyophilisation 53 thermoplastic molding 53 CIGS copper indium 53 SpecMetrix 53 SWCNT 53 polylactide 53 silica spheres 53 specialty monomers 53 microdevices 53 BIOX ® 53 PEEK OPTIMA 53 X ray microscopy 53 microfluidic chips 53 silicon oxynitride 53 planarity 53 submicron 53 PolyMax 53 nanotechnology MEMS 53 nucleation layer 53 displacement chromatography 53 GaAs substrates 53 CIGS Copper Indium 53 extrusion molding 53 polymer matrices 52 UV NIL 52 microfabrication techniques 52 nanostructuring 52 nano porous 52 gallium arsenide gallium nitride 52 solubilization 52 microvia 52 thermoplastic TPV 52 thermoplastic polyurethane TPU 52 pyrogenic silica 52 ion implant 52 optoelectronic packaging 52 reflow solder 52 eutectic 52 #.# micron CMOS 52 laser scribing 52 silicone elastomers 52 conductive epoxy 52 micromorph 52 graphitic carbon 52 defectivity 52 silicon germanium SiGe 52 germanium substrates 52 indium tin oxide ITO 52 functionalizing 52 tabletting 52 wirebond 52 anion exchange 52 boron nitride 52 MEMS MOEMS 52 substrate 52 passivating 52 polymer composite 52 doped silicon 52 DFM DFY 52 polymer electrolyte 52 SOI MEMS 52 Perkinamine 52 biocatalytic processes 52 silicon carbide ceramic 52 solder alloy 52 solventless 52 ceramic dielectric 52 GaAs substrate 52 gas chromatographs 52 photoresists 52 conductive polymer 52 epitaxial layers 52 aligned carbon nanotubes 52 agarose 52 metallic interconnects 52 gallium phosphide 52 SN#C 52 CIS CIGS 52 germanium substrate 52 leachables 52 epitaxial 52 thinner wafers 52 nanoimprinting 52 FT NIR 52 through silicon vias 52 #nm immersion lithography 52 silicon germanium SiGe BiCMOS 52 MEMS resonators 52 Tritan ™ 52 sintered metal 52 nanoimprint 52 electrospray mass spectrometry 52 substrates 52 adsorbents 52 FEOL 52 Magnetic nanoparticles 52 SOI wafer 52 #nm DRAM 52 CdTe Si 52 photoactive 52 antireflection 52 glass frit 52 dimensional nanostructures 52 solder reflow 52 pre preg 52 silicon tetrachloride 52 k gate dielectric 52 PLA polymer 52 nano imprint lithography 52 stencil printing 52 Dektak 52 biocompatible polymers 52 silicone encapsulation 52 HfO2 52 semiconductor wafers 52 microelectronic device 52 epiwafer 52 CBT resin 52 photopolymers 52 wettability 52 solder pastes 52 polymer coatings 52 quantum dots QDs 52 Imec performs world 52 chemical reagents 52 nanoarrays 52 ultrapure water 52 CMOS RF CMOS 52 organic photovoltaics 52 polymerisation 52 Formic acid 52 EUV mask 52 micrometre scale 52 Deep Reactive Ion Etch 52 barium sulfate 52 nanoscale patterning 52 electron optics 52 phthalocyanine 52 Novellus SABRE 52 electro optic polymer 52 siloxane 52 thermal conduction 52 particle sizing 51 PbS 51 Dip Pen Nanolithography ® 51 design kits PDKs 51 insulator SOI technology 51 extreme ultraviolet lithography 51 multicrystalline silicon 51 insulator wafers 51 electro optical polymer 51 aqueous dispersion 51 Grätzel cells 51 monosilane 51 nanometal 51 nanocoatings 51 precision metrology 51 amorphous silica 51 dielectrics 51 aluminosilicate clay 51 UV absorbers 51 nanopillar 51 HRTEM 51 ferrite 51 gelation 51 sodium silicide 51 MetaPULSE 51 passivation layers 51 bismuth telluride 51 gallium arsenide indium phosphide 51 layer deposition ALD 51 maskless lithography 51 epitaxial wafer 51 microfine 51 MALDI imaging 51 defoaming 51 CVD etch 51 nanosheets 51 indium arsenide 51 metallic alloys 51 boron carbide 51 InGaP 51 magnesium fluoride 51 coextruded 51 nanochannel 51 BiCMOS 51 PET preforms 51 solder paste 51 argon fluoride 51 nanocoating 51 thermally stable 51 etching DRIE 51 k gate dielectrics 51 ionic contamination 51 weatherability 51 polymer nanocomposite 51 sulfonated 51 sSOI 51 epitaxially 51 Silicon nanowires 51 reflow soldering 51 DongbuAnam 51 ultrafiltration membrane 51 nanofibre 51 CIGSe 51 silicon 51 nanoscale characterization 51 CarboGran 51 nanoparticle inks 51 catalytic oxidation 51 #nm immersion 51 resin infusion 51 hydroxide ions 51 expandable foam 51 oxidisation 51 #nm geometries 51 protein microarrays 51 Selective Laser Sintering SLS 51 transparent conductive films 51 silicon etching 51 hermetic packaging 51 #μm thick [002] 51 AQUANOX A# 51 uniaxial strain 51 Calibre LFD 51 boron trifluoride 51 bioelectronic 51 Copper Indium Gallium Selenide 51 transparent conductive oxide 51 heterostructure 51 chemically reactive 51 scintillator 51 integrated passives 51 #nm nodes 51 epitaxial layer 51 electrolyte membranes 51 nitride 51 indium gallium phosphide 51 subwavelength 51 FusionQuad 51 absorption spectroscopy 51 BioCel 51 pipette tips 51 composite laminates 51 thermomechanical 51 metalorganic chemical vapor deposition 51 pHEMT 51 RO membrane 51 molecular sieve 51 degumming 51 MESFET 51 parametric yield 51 PVD CVD 51 colloidal suspension 51 HVPE 51 hydride vapor phase 51 indium nitride 51 CdTe PV 51 metallic nanoparticles 51 GaN wafer 51 electrochemical sensor 51 thermosetting resin 51 MEMS fabrication 51 emission spectroscopy 51 CNT FED 51 geopolymer 51 #.# micron node 51 Victrex PEEK 51 opto electrical 51 polysulfone 51 MAPPER 51 SMS NIL 51 film transistors TFTs 51 nano tubes 51 ALLVIA 51 Cadmium Telluride 51 ChemetriQ 51 coextrusion 51 anionic 51 flowability 51 non pyrogenic 51 sorption 51 Polycrystalline 51 cadmium selenide 51 SurePrint 51 microelectronic packaging 51 optically transparent 51 InN 51 battery anodes 51 barium titanate 51 micro encapsulation 51 rigid substrate 51 microstructures 51 Copper Indium Gallium 51 indium gallium phosphide InGaP 51 conductive pastes 51 carbon nanotubes CNT 51 ProteinChip 51 conductive coating 51 laser micromachining 51 optical biosensors 51 Metrology System 51 microelectronic devices 51 C#F# [002] 51 SOI CMOS 51 chemically resistant 51 TiO2 nanoparticles 51 lyophilised 51 imprint lithography 51 adsorbent 51 #.#um CMOS 51 Topsoe 51 centrifuging 51 crystallinity 51 SIMOX 51 inorganic salts 51 IGBT Insulated Gate 51 DEV DA TOMAR NEXT 51 nanometric films 51 TiN 51 weldability 51 HEMTs 51 Insulator SOI 51 MWNT 51 micro optics 51 TGA# SL 51 zinc selenide 51 GaAs GaN 50 Semiconducting 50 halide 50 zirconate 50 particle dispersion 50 parylene 50 k dielectric 50 DPN ® 50 k dielectrics 50 nonpolar GaN 50 coating thickness 50 lithography simulation 50 optical metrology 50 DSSCs 50 SiC substrates 50 CVD diamond 50 CIGS solar 50 ALTUS Max 50 LTQ Orbitrap XL 50 CMP slurry 50 photobleaching 50 microelectronic components 50 titanium zirconium 50 polymer matrix 50 redox reactions 50 resistive element 50 nickel hydroxide 50 acid hydrolysis 50 hardcoat 50 rainscreen cladding 50 microporous membranes 50 wafer bonders 50 antireflection coatings 50 TEM STEM 50 silicon substrate 50 solder mask 50 MEMS NEMS 50 silicon nanoparticles 50 embedded nonvolatile memory 50 polymer beads 50 anionic surfactants 50 MALDI-TOF/TOF 50 HDP CVD 50 powderREV 50 multiplexed assays 50 insulator substrate 50 ellipsometry 50 electroplating 50 micro fluidic 50 hydrogen peroxide H#O# 50 underfill 50 hydrous 50 scatterometry 50 Follow Vishay 50 Picogiga delivers advanced 50 dopant 50 thermal oxidation 50 transparent conductive coatings 50 AlSiC 50 metallurgically bonded 50 crystalline Si 50 micro machining 50 barium carbonate 50 cadmium selenium 50 Cree GaN 50 SiC wafers 50 Novaled PIN OLED 50 overlay metrology 50 granulates 50 HPLC columns 50 micromachining 50 nanosized 50 polysiloxane 50 de ionized 50 Synopsys DFM 50 metalcutting 50 dielectric materials 50 deep sub micron 50 semiconductor nanostructures 50 carbon nanotubes CNTs 50 sapphire wafers 50 nanocomposite material 50 ultrafiltration membranes 50 solution processable 50 glacial acetic acid 50 deinking 50 Indium phosphide 50 stereolithography 50 interfacial properties 50 polymerizes 50 Picogiga 50 absorber layers 50 micronised 50 polymeric 50 transparent electrodes 50 photoconductive 50 polyurethane resins 50 mass spectrometry instrumentation 50 e beam lithography 50 microemulsion 50 Silicon wafers 50 monocrystalline silicon wafers 50 thermoplastic elastomers 50 lithium niobate 50 inorganic molecules 50 polymer blends 50 dye sensitized 50 microfabricated 50 rigid polyurethane foams 50 aluminum gallium nitride 50 cathodic 50 ferrites 50 cadmium sulphide 50 ceramic coatings 50 leaded solder 50 VUV 50 #nm #nm [005] 50 oxidation catalyst 50 manganite 50 fxP 50 silicon waveguide 50 collimators 50 Si substrate 50 XT #i 50 UV curable coatings 50 Clear Shape 50 silicon DRIE 50 TOF TOF 50 nano patterning 50 nano coatings 50 Applied Nanoscience Inc. 50 catalytic reactions 50 mask aligners 50 aluminum nitride AlN 50 magnetostrictive 50 wafer foundries 50 thermoset composites 50 tunable optical 50 cuvette 50 Focused Ion Beam 50 crystallites 50 ultra violet curable 50 Nova NanoSEM 50 manufactures integrated circuits 50 nanocomponents 50 polymer synthesis 50 Chemical Mechanical Polishing 50 rigid polyurethane foam 50 reinforced thermoplastic 50 TQFP packages 50 polymeric membrane 50 titanium pigment 50 micromachined 50 capillary electrophoresis 50 molybdenum disulfide 50 embedded capacitor 50 Silicon Germanium 50 tunable RF 50 preanalytical 50 permeable membranes 50 coatings inks 50 selective emitter 50 nanopolymer 50 silane 50 UltraWave 50 activated carbons 50 Raman spectrometer 50 fused silica 50 Oxide Silicon 50 magnetic bead 50 detector arrays 50 halides 50 nano fabrication 50 Aluminum Nitride 50 silicon PV modules 50 CIGS PV 50 melt viscosity 50 MAX# integrates 50 nonconductive 50 regenerable 50 engineered substrates 50 Aixtron MOCVD 50 vinyl esters 50 provides rewriteable NVM 50 microRNA profiling 50 SnO2 50 nanolayers 50 neutron absorption 50 prepregs 50 tellurium selenium iridium 50 nanopositioning 50 corrosive fluids 50 Gallium Nitride 50 AFM probes 50 monolayer 50 biocatalytic 50 epitaxial silicon 50 flowable 50 syntactic foam 50 encapsulant sheets 49 SiPs 49 fluorescence spectroscopy 49 silica substrate 49 gallium indium 49 VIISta HC 49 thermoplastic polymers 49 EVOH 49 correction OPC 49 monolithic microwave integrated 49 nm SRAM 49 thermally activated 49 electrochemical detection 49 Polyimide 49 thermoplastic polymer 49 inorganic compounds 49 titanium carbide 49 AlGaN GaN 49 manufacturability 49 Airborne Particle Sensor 49 oxidative stability 49 Alchimer 49 nano engineered 49 semiconductor fabs 49 CMOS logic 49 Immersion Lithography 49 filtration membranes 49 HydroFix 49 ArF 49 filtration reverse osmosis 49 backside metallization 49 moisture absorption 49 formate 49 tetrachloride 49 corrosion inhibition 49 #.#um [001] 49 Langmuir Blodgett 49 Qdot 49 crystal lattices 49 X ray diffraction XRD 49 IQ Aligner 49 Alanod Solar 49 MEMS microelectromechanical systems 49 UV VIS 49 nanofluidic devices 49 aluminum gallium arsenide 49 bilayers 49 PowerShield 49 radiochemical 49 photopolymer 49 nanosilicon 49 microfocus X ray 49 EDXRF 49 ion implanter 49 throughput mass spectrometry 49 microfabrication 49 Parylene 49 3Xnm 49 SOI wafers 49 laminate substrate 49 pipette tip 49 carbon airgel 49 plastics fibers 49 microchannel plate 49 gasketing 49 nanocrystalline diamond 49 High Voltage CMOS 49 enzymes immunodiagnostics 49 electrochemically 49 gelcoats 49 polymer substrates 49 wafer thickness 49 Aluminum Oxide 49 wafer lithography 49 Dynabeads 49 porous membranes 49 nanoclays 49 Chemical Mechanical Planarization 49 Silicon CMOS Photonics 49 phototransistors 49 wet granulation 49 GaN layers 49 accuracy repeatability 49 solder bumps 49 Germanium 49 photolithography 49 silicon nitride ceramic 49 microtubes 49 III V epiwafers 49 dielectric layer 49 GaAs gallium arsenide 49 heterojunction 49 nanoimprint lithography 49 wafer bonding 49 pH electrode 49 Flip Chip 49 ultrahigh purity 49 adsorptive 49 sprayable 49 hydroxides 49 aluminum gallium indium 49 TappingMode 49 photocatalysts 49 etchers 49 On Insulator SOI 49 carbonyls 49 Valox 49 EVG# 49 hermetic sealing 49 rheology modifiers 49 ionomer 49 CMOS transistors 49 heterojunction bipolar transistor HBT 49 Santoprene TPV B# 49 die bonders 49 aqueous polymer 49 SiGe C 49 voltage CMOS 49 #.#μ 49 thixotropic 49 triacetate 49 HiPOx 49 bentonite clay 49 inorganic materials 49 CIGS solar cell 49 Aera2 49 photovoltaic module 49 indium phosphide 49 photomultipliers 49 TFPV 49 Sample Processor 49 packaging WLP 49 benchtop instrument 49 PEDOT PSS 49 reflow oven 49 anneal 49 x ray fluorescence 49 inkjet inks 49 yttria 49 poly Si 49 nitriding 49 heterogeneous catalysts 49 asphaltenes 49 enzymatic reactions immunodiagnostics 49 #nm CMOS [001] 49 UV curable 49 crystalline silicon c 49 MWNTs 49 actinide 49 molten solder 49 vaporisation 49 x ray optics 49 remineralization 49 Lithium Ion Li Ion 49 Zeolites 49 rigid PVC 49 Epitaxial 49 graphite oxide 49 tuner IC 49 Inkjet printing 49 RFCMOS 49 Lumiramic phosphor technology 49 thermoplastic elastomer 49 polystyrene beads 49 removes impurities 49 offgas 49 conformal coating 49 polymeric composites 49 supercritical carbon dioxide 49 interfacial layer 49 electrochemical separations 49 atomic spectroscopy 49 Ascentis Express 49 titanium nitride 49 CIGS photovoltaic PV 49 Kilopass XPM 49 deflashing 49 QMEMS 49 tin plating 49 membrane bioreactors 49 microfluidic channels 49 chromatographic separation 49 Gallium Arsenide 49 microspectroscopy 49 nanomanipulation 49 handheld XRF 49 feedthroughs 49 AlGaInP 49 polybutadiene 49 GaN LEDs 49 radiolabeling 49 photothermal 49 pentacene 49 thermoform 49 conductive ink 49 organic photovoltaic OPV 49 monochromator 49 advanced leadframe 49 bicomponent 49 metallizing 49 indium gallium nitride InGaN 49 chemical reactivity 49 MaxEdge 49 dichromate 49 ultrafiltration UF 49 chalcogenide glass 49 LC MALDI 49 Helios XP 49 semiconducting nanowires 49 bipolar CMOS DMOS 49 borosilicate 49 semiconducting properties 49 #.#mm# [001] 49 microcrystalline silicon 49 photonic bandgap 49 copper indium gallium diselenide 49 micrometer sized particles 49 using CMOS BiCMOS 49 hydrometallurgical processing 49 printability