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(Click for frequent words.) 76 k dielectric 74 pMOS 74 nickel silicide 74 hafnium oxide 73 dielectrics 72 k dielectrics 72 HfSiON 72 k gate dielectric 72 gate dielectric 71 CMOS transistors 71 silicide 71 FinFETs 71 AlGaN 71 SiON 70 gate electrode 70 MOS transistors 70 dielectric materials 70 silicon Si 69 nMOS 69 oxide thickness 69 SiO 2 68 k gate dielectrics 68 low k dielectrics 68 FinFET 68 low k dielectric 68 silicon oxynitride 68 AlGaN GaN 68 oxynitride 68 NiSi 68 dielectric constant 67 electron mobility 67 MOS transistor 67 crystallinity 67 K dielectrics 67 dopant 66 PMOS transistors 66 pentacene 66 LiNbO3 66 nitride 66 dielectric layer 66 Si substrate 66 graphene transistors 66 TiN 66 indium arsenide 66 nanocrystalline 66 aluminum nitride 66 electrically insulating 66 nitride semiconductor 66 hafnium 65 dielectric layers 65 indium gallium 65 III nitride 65 AlN 65 #.#μ 65 #nm immersion lithography 65 superlattice 65 ZnO 65 oxide semiconductor 65 epitaxial layer 65 ZnSe 65 Gallium arsenide 65 parasitic capacitance 65 HEMT 65 InAs 65 silicon nitride 65 SiO2 65 photonic bandgap 65 epitaxial layers 65 copper interconnects 65 manganite 65 optical waveguides 65 defect densities 65 microcavities 65 ZnO nanowires 64 through silicon vias 64 heterostructure 64 doped silicon 64 silicon germanium SiGe 64 silicon substrates 64 polycrystalline 64 eutectic alloy 64 HfO2 64 SOI silicon 64 silicon CMOS 64 dopants 64 threshold voltages 64 eutectic 64 high-k/metal gate 64 #nm node [001] 64 silicon germanium 64 Si substrates 64 PZT 64 FUSI 64 indium phosphide 64 ZnS 64 SWCNT 64 epitaxial silicon 64 CdSe 64 silicon 64 SOI CMOS 64 Cu interconnects 64 CMOS circuits 64 ferroelectrics 64 strontium titanate 64 dielectric 63 Epitaxial 63 metallisation 63 planarization 63 copper metallization 63 epitaxy 63 titania 63 nanocrystal 63 gallium indium arsenide 63 multilayers 63 semiconductive 63 film transistors TFTs 63 silicon dioxide 63 graphene layers 63 CMOS fabrication 63 dual damascene 63 Schottky 63 submicron 63 AlN layer 63 MESFET 63 HEMTs 63 bismuth telluride 63 silicon substrate 63 subwavelength 63 ferromagnetic 63 ferroelectric 63 pHEMT 63 semiconducting 63 optically transparent 63 #nm silicon 63 nanotube arrays 63 bandgap 63 amorphous silicon Si 63 silica spheres 63 leakage currents 62 antimonide 62 #nm CMOS [002] 62 passivation layer 62 heterostructures 62 cadmium selenide 62 barium titanate 62 BEOL 62 phototransistors 62 Complementary Metal Oxide Semiconductor 62 intermetallic 62 chalcogenide 62 GLOBALFOUNDRIES #nm 62 InGaN 62 AlGaAs 62 interfacial layer 62 deep sub micron 62 YBCO 62 nanoporous 62 planar CMOS 62 transparent electrode 62 insulator wafers 62 Schottky diode 62 CMOS processes 62 SiC substrates 62 geometries shrink 62 semiconductor nanowires 62 nanomesh 62 gallium indium 62 insulator SOI technology 62 #.# micron CMOS 62 indium phosphide InP 62 SOI substrates 62 Silicon Germanium 62 solder bumping 61 TSVs 61 bandgaps 61 self assembled monolayers 61 ferroelectric materials 61 zinc selenide 61 SiC 61 FDSOI 61 tin oxide 61 monolithically integrated 61 InGaP 61 nanometric 61 insulator substrate 61 InP 61 substrate 61 JFET 61 GaN layer 61 solder bumps 61 photoresists 61 SiGe bipolar 61 InN 61 MEMS resonators 61 nitrides 61 aluminum gallium nitride 61 undoped 61 oxide thickness EOT 61 capacitances 61 coercivity 61 ohmic contacts 61 HKMG 61 crystal lattices 61 aluminum nitride AlN 61 RRAM 61 CMOS compatible 61 Si SiGe 61 microcavity 61 heterojunction 61 mechanical polishing CMP 61 zirconium oxide 61 selenide 61 Carbon nanotube 61 Hafnium 61 microstructured 61 laterally diffused metal 61 Indium Phosphide 61 nanochannels 61 photonic devices 61 SOI substrate 61 Insulator SOI 61 epitaxial 61 InGaAs 61 lattice mismatch 61 Gallium Arsenide GaAs 61 MLCCs 61 CMOS logic 61 ruthenium oxide 61 silicon waveguides 61 planar 61 gelation 61 QDs 61 nanostructured surfaces 61 metallic nanostructures 61 Silicon Nitride 61 PEDOT 61 Field Effect Transistor 61 sapphire substrate 61 3Xnm 61 semiconducting material 61 millisecond anneal 60 LDMOS RF power 60 InSb 60 calcium fluoride 60 nanometer silicon 60 semiconducting nanowires 60 conductive polymer 60 crystallites 60 conductive coating 60 yttrium barium copper 60 transparent conductive oxides 60 thermo mechanical 60 #.# micron node 60 uniaxial strain 60 Strained silicon 60 varactors 60 UVTP 60 ytterbium 60 conductive epoxy 60 sputter deposition 60 lithographic techniques 60 metal gate HKMG 60 metal insulator 60 nanobelts 60 Josephson junctions 60 pulsed laser deposition 60 Photolithography 60 polydimethylsiloxane 60 1μm 60 NMOS 60 GaP 60 MAX# integrates 60 nanodots 60 CMOS silicon 60 transparent conductive 60 CIGS copper indium 60 oxide layer 60 nanotubes nanowires 60 self assembled monolayer 60 lanthanum aluminate 60 CdS 60 transistor pHEMT 60 BJTs 60 Raman lasers 60 heavy fermion 60 polydimethylsiloxane PDMS 60 microcrystalline 60 Field Effect Transistors 60 indium tin oxide ITO 60 germanium 60 silicon oxide 60 underfill 60 DMOS 60 bipolar transistors 60 ferrite 60 lithium niobate 60 reactive ion 60 GaAs MESFET 60 interfacial 60 insulator SOI 60 PIN diodes 60 macroscale 60 #.#um [001] 60 bismuth ferrite 60 polyaniline 60 line BEOL 60 organic TFTs 60 nonlinear optical 60 ellipsometry 60 tensile stress 60 ferroelectricity 60 stripline 60 optically coupled 60 nanofabricated 59 Powerful debug 59 ferromagnet 59 mosfet 59 On Insulator SOI 59 CIS CIGS 59 Zener diodes 59 P3HT 59 VCSELs 59 graphene nanoribbons 59 4H SiC 59 Si Ge 59 thermal conductivities 59 transparent conductive coatings 59 PHEMT 59 high-k/metal-gate 59 electron tunneling 59 geometries 59 nanoribbons 59 intergranular 59 indium gallium arsenide 59 Ytterbium 59 photodetectors 59 crystalline Si 59 tantalum nitride 59 photonic crystal 59 UMC #nm 59 MWNTs 59 thermally conductive 59 lithographic processes 59 Electron Mobility Transistor 59 nanophotonic 59 voltage CMOS 59 bilayer graphene 59 monolithic microwave integrated 59 silicate glass 59 wirewound 59 multilayer ceramic 59 nanofilm 59 tantalum capacitors 59 nonmagnetic 59 nanowire transistors 59 solder bump 59 planarity 59 SWNT 59 Schottky barrier 59 nm nodes 59 nanometer scale 59 nitride layer 59 perovskite 59 SiGe 59 transistor leakage 59 germanium substrates 59 5V CMOS 59 Gallium Arsenide 59 thermally stable 59 ferrites 59 atomically smooth 59 thermally activated 59 silicon nanowire 59 conductivities 59 dopant atoms 59 intermetallic compounds 59 5μm 59 Zeolites 59 block copolymer 59 k dielectric materials 59 IGBT Insulated Gate 59 gate transistors 59 CMOS 59 amorphous silicon 59 #nm CMOS [001] 59 transconductance 59 nm node 59 titanium nitride 59 nanopillars 59 copper indium diselenide 59 chalcogenide glass 59 #μm [001] 59 gallium nitride 59 wafer thickness 59 tin Sn 59 antiferromagnetic 59 vanadium oxide 59 interdigitated 59 dielectric etch 59 Germanium 59 toroids 58 gallium arsenide 58 antiferromagnets 58 electroless 58 SAW oscillators 58 photomultipliers 58 semiconductor nanostructures 58 gallium selenide 58 quantum capacitance 58 CIGS solar cell 58 #.#μm [002] 58 #nm/#nm 58 FETs 58 polymer matrix 58 gallium nitride GaN 58 epitaxy HVPE 58 micromachined 58 transistor 58 cadmium sulfide 58 optical waveguide 58 passivation 58 polymeric 58 carrier mobilities 58 dielectric constants 58 SWNTs 58 chalcogenides 58 paramagnetic 58 weldability 58 semiconducting properties 58 leadframes 58 resistive element 58 arsenide 58 silicon nanocrystals 58 multiferroic 58 epi wafers 58 Cadmium Telluride CdTe 58 bipolar transistor 58 PIN photodiodes 58 transparent conductive oxide 58 MWNT 58 Amorphous silicon 58 UNCD 58 PIN diode 58 thermal conduction 58 silicon waveguide 58 nonpolar GaN 58 #μm [002] 58 mesoporous 58 pn junctions 58 Ge substrates 58 rectifier diode 58 metallization 58 poly Si 58 5nm 58 thermo compression 58 vapor deposition 58 bilayers 58 wirebond 58 SiC Schottky diodes 58 Indium phosphide 58 solderable 58 superhard 58 ferromagnetism 58 photolithographic 58 semiconductor nanocrystals 58 biomolecule 58 breakdown voltages 58 QMEMS 58 AlGaInP 58 conjugated polymers 58 μm thick 58 indium tin oxide 58 patterning technique 58 electron transistors 58 photoluminescence 58 nm CMOS process 58 cuprates 58 antifuse 58 layer graphene 58 gallium indium phosphide 58 Oxide Silicon 58 anisotropic 58 #nm #nm #nm 58 #.#μm [001] 58 #nm nodes 58 macroporous 58 nonconducting 58 CMOS oscillators 58 BiCMOS 58 substrates 58 GaAs substrates 58 indium gallium nitride InGaN 58 superlenses 58 thermodynamically stable 58 nanocomposites 58 uniaxial 58 ferromagnetic materials 58 thermoplastic polyester 58 colloidal nanocrystals 58 Semiconducting 58 SOI wafers 58 plasma etching 58 carbon nanotube transistors 58 GaN 58 smaller geometries 58 micron thick 58 finFETs 58 silicon photonic 58 microchannel plate 58 thermal conductivity 58 cordierite 58 nanocomposite material 58 polymer substrates 58 CVD diamond 58 GaN transistor 58 wafer dicing 58 GaAs AlGaAs 58 surface passivation 57 thinner wafers 57 JFETs 57 semiconducting materials 57 nanometer node 57 interparticle 57 biaxial 57 solution processible 57 defectivity 57 PLLA 57 vertical cavity 57 photonic circuits 57 excitonic 57 GaAs 57 nanomembranes 57 monodisperse 57 electrodeposition 57 SiGe C 57 ion traps 57 vanadium dioxide 57 polyimides 57 reconfigurable logic 57 #μm thick [002] 57 nanolayers 57 nitrided 57 conductive adhesives 57 nanocluster 57 nanoimprint 57 Plasmonic 57 GaN wafers 57 SRAM DRAM 57 OTFT 57 overmolding 57 carbon nanotube CNT 57 Bipolar Transistor 57 zener diodes 57 electromigration 57 boron nitride 57 SIMOX 57 transparent electrodes 57 LPCVD 57 photoresist 57 microfabricated 57 PIN photodiode 57 nanoscale 57 ZnO nanowire 57 Transparent Conductive Oxide TCO 57 nanocrystals 57 microstructural 57 sulfonated 57 milliohm 57 magnetron sputtering 57 epitaxially grown 57 nanostructures 57 Photonic crystals 57 capacitance 57 ferro electric 57 monolayer 57 resistor capacitor 57 spiral inductors 57 Arsenide 57 dye sensitized 57 multijunction solar cells 57 CMOS RF CMOS 57 sol gel 57 photodetector 57 topological insulators 57 Ruthenium 57 x ray optics 57 electron transistor 57 liquid crystalline 57 insulating substrate 57 di selenide CIGS 57 millisecond annealing 57 dilute nitride 57 PEDOT PSS 57 MOSFETS 57 chipscale 57 furnaceware 57 parasitic inductance 57 iCoupler 57 indium antimonide 57 transistor HEMT 57 microstructures 57 planar transistors 57 coplanar 57 PEEK OPTIMA 57 Silicon Oxide Nitride 57 quantum metrology 57 waveguides 57 hydrophobicity 57 silicon transistors 57 gasketing 57 VCSEL 57 BGA packaging 57 Cree GaN 57 electron scattering 57 #.#μm CMOS process 57 nanowire 57 CdTe Si 57 high-k/metal gate HKMG 57 tribological 57 compressive strain 57 nanosized 57 anionic 57 spintronic 57 pellicle 57 glass frit 57 AlN substrates 57 silicon etch 57 hydride vapor phase 57 TFTs 57 nanoribbon 57 nanofilms 57 pore sizes 57 nanowire arrays 57 nano imprint lithography 57 TSMC #nm [001] 57 Inductors 57 GaN substrates 57 advanced leadframe 57 Aluminum Nitride 57 absorber layers 57 dielectric breakdown 57 piezoelectric properties 57 valence electrons 57 micrometer thick 57 resonant tunneling 57 CNTs 57 conductivity 57 quasicrystals 57 immersion lithography 57 polariton 57 functionalized 57 2μm 57 correlated electron 57 crystalline silicon c 57 metal oxide 57 microfabrication techniques 57 sub micron 57 spintronic devices 57 molecular sieves 57 leadframe 57 electro optic plastics 57 chemical reactivity 57 indium gallium phosphide InGaP 57 microporous 57 high voltage BCDMOS 57 circuit MMIC 57 extreme ultraviolet lithography 57 e beam lithography 57 electrical conductance 57 Si wafers 57 gallium phosphide 57 zener diode 57 micrometer sized 56 temperature superconducting 56 elastic modulus 56 photomultiplier tubes 56 inhomogeneity 56 multilayer 56 catalytic reactions 56 electroluminescence EL 56 RF transistors 56 microfluidic chips 56 Flip Chip 56 nanochannel 56 PVD CVD 56 MWCNTs 56 LDMOS 56 nanoelectromechanical systems 56 optical coatings 56 compressive stress 56 FPGA fabric 56 carbides 56 agarose 56 gallium arsenide gallium nitride 56 #nm SOI 56 birefringence 56 optofluidic 56 palladium Pd 56 passivation layers 56 DPSS lasers 56 metallic interconnects 56 silicone carbide 56 bilayer 56 electroless copper 56 High Voltage CMOS 56 electrochemical deposition 56 Zinc Oxide 56 copper nanorods 56 lead zirconate titanate 56 deep submicron CMOS 56 .# micron 56 epitaxial structures 56 #.#nm [002] 56 Nanowires 56 iron pnictides 56 encapsulant sheets 56 antireflection 56 capacitors inductors 56 dielectric strength 56 thermal impedance 56 imprint lithography 56 GaAs InP 56 Grätzel cells 56 deep submicron 56 FD SOI 56 cuprate 56 diffractive optical elements 56 bistability 56 #.# micron SiGe 56 #nm #nm [002] 56 HBLEDs 56 Nitride 56 nano scale 56 nanocircuits 56 TSMC #nm process 56 nonpolar 56 ZrO 2 56 semiconducting nanotubes 56 Polycrystalline 56 QCLs 56 dimensional nanostructures 56 zero valent iron 56 linewidth 56 scintillator 56 silicon modulators 56 inhomogeneities 56 InGaP HBT 56 photocurrent 56 THz frequencies 56 crosslinking 56 UV absorbance 56 inorganic semiconductors 56 mesoscopic 56 NdFeB 56 CIGS Copper Indium 56 SiC wafers 56 silicon oxynitride SiON 56 gold nanoclusters 56 transistors HEMTs 56 Through Silicon Vias 56 FeRAM 56 photoemission 56 Resistive Random Access 56 ionic conductivity 56 nanometer 56 porous silicon 56 Fabry Perot 56 outcoupling 56 absorption spectroscopy 56 GaN HEMTs 56 photolithography 56 Ti 4V 56 epitaxial deposition 56 martensitic 56 magnetostrictive 56 Low Leakage 56 Silicon carbide 56 Vdd 56 carbene 56 parasitic capacitances 56 boron nitride nanotubes 56 wide bandgap 56 LSA#A 56 computational lithography 56 X ray microscopy 56 analog circuitry 56 indium gallium arsenide InGaAs 56 germanium antimony 56 block copolymers 56 multi walled nanotubes 56 graphene transistor 56 piezo ceramic 56 antireflective coatings 56 permittivity 56 dimensional planar 56 GaAs HBT 56 magnetisation 56 SOI wafer 56 RFCMOS 56 linewidths 56 photoconversion 56 AccelArray 56 parylene 56 polymer nanofibers 56 lanthanum oxide 56 cadmium selenium 56 nanostructuring 56 FEOL 56 nm CMOS 56 protein adsorption 56 photoconductive 56 Organic Chemical Vapor 56 hafnium dioxide 56 electrical conductivity 56 icosahedral 56 MgO 56 electrophoretic 56 pnictides 56 X7R 56 conformal 56 CIGS solar cells 56 metallic alloys 56 Czochralski 56 GaN transistors 56 RF circuitry 56 #nm node [002] 56 EO polymer 56 microstrip 56 wire bondable 56 silicon Mach Zehnder 56 microfabrication 56 biologically inert 56 titanium carbide 56 oxide nanoparticles 56 electron doped 56 transimpedance amplifier 56 Ferroelectric 56 athermal 56 manufacturable 56 SOI Silicon 56 photodiode 56 anodic 56 colloidal crystals 56 Schottky diodes 56 ceramic substrate 56 CellMath IP 56 homogeneous catalysis 56 THz radiation 56 coextruded 56 polymer membranes 55 μm diameter 55 birefringent 55 serializer deserializer 55 ArF immersion lithography 55 BiFET 55 wettability 55 nanoparticulate 55 TSMC #.#um 55 etching DRIE 55 magnesium fluoride 55 Josephson junction 55 ceria 55 ITRS roadmap 55 Perkinamine 55 SiPs 55 Silicon Dioxide 55 nano imprint 55 nanorod 55 microelectronic devices 55 micro optics 55 graphene sheets 55 superlens 55 photocatalysts 55 Copper Indium Gallium Selenide 55 Aerogels 55 CIGS cells 55 MgB2 55 molybdenum disulfide 55 heterojunctions 55 solution processable 55 nano powders 55 flexible substrates 55 zeolite membranes 55 Nd YAG lasers 55 #LP [002] 55 chip optical interconnects 55 nanocomposite materials 55 capacitors 55 microcrystalline silicon 55 nano patterning 55 biocompatible polymers 55 cathode materials 55 passivated 55 HVPE 55 fused silica 55 Structured ASICs 55 ExpressFabric technology 55 crystalline solids 55 bulk heterojunction 55 cadmium sulphide 55 potassium niobate 55 TiO 2 55 transistor arrays 55 DSSCs 55 absorber layer 55 CoO 55 exciton 55 Vertical Cavity Surface Emitting 55 #nC 55 intramolecular 55 nanostructure 55 nanocages 55 superparamagnetic 55 micrometre scale 55 nanofabrication techniques 55 electrospray 55 chiral compounds 55 quantum dots 55 Terbium 55 polymer composites 55 silicon dioxide SiO2 55 nanosprings 55 silicon nanoparticles 55 superlattices 55 varistor 55 BCDMOS 55 #μ 55 GAIN HBT 55 polymer coatings 55 GaN layers 55 monolithic CMOS 55 nitrogen doped 55 Cadmium Telluride 55 copper indium 55 deep silicon etch 55 nanostructured materials 55 nanosilicon 55 nanodiamond 55 Photoresist 55 semiconducting polymer 55 #.#um CMOS 55 micro machined 55 sSOI 55 Follow Vishay 55 atomically thin 55 Germanium Ge 55 indium nitride 55 reflowed 55 fluorescence spectroscopy 55 ferrite core 55 thermoelectric materials 55 photonic 55 transistors 55 unclonable 55 emitting lasers 55 microscopy techniques 55 metal oxide nanoparticles 55 superconductive 55 Indium Phosphide InP 55 SiC MOSFET 55 Silicon dioxide 55 Ferrite 55 Gallium Nitride 55 ferritic 55 optical lithography 55 analog circuits 55 nanomagnets 55 piezoresistive 55 thulium 55 nanometer CMOS 55 bistable 55 polymer matrices 55 x ray absorption spectroscopy 55 nanometer sized 55 ACPL K# 55 Titanate 55 ReRAM 55 UV NIL 55 intermolecular 55 electroactive 55 photobleaching 55 nanoantenna 55 steric 55 reentrant 55 multilayer stacks 55 nanoscopic 55 HKMG technology 55 SAXS 55 titanate 55 2Xnm 55 AlSiC 55 aluminum gallium arsenide 55 #nm RF CMOS 55 monolayers 55 graphene nanoribbon 55 epitaxial wafers 55 Bragg grating 55 embedded SRAM 55 atomic lattice