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(Click for frequent words.) 60 TSVs 56 through silicon vias 54 WLCSP 54 #nm DRAM 54 metallization 53 wafer thinning 53 FEOL 52 3D TSV 51 BEOL 51 wafer bonding 51 SUSS MicroTec 51 wafer bumping 51 Silicon Via 50 interposer 50 FinFETs 50 Flip Chip 50 vias 49 #nm immersion lithography 49 PECVD 49 Wafer Level Packaging 49 ALLVIA 49 package SiP 49 leadframe 49 FinFET 49 NANOIDENT 49 reactive ion 49 epitaxy 49 photoresist 48 #.#μm [002] 48 dielectric etch 48 #.#um [001] 48 EUV lithography 48 immersion lithography 48 photolithography 48 silicon 48 3Xnm 47 nanoimprint 47 SOI wafer 47 copper interconnects 47 SiC 47 epitaxial 47 solder bumping 47 nano imprint lithography 47 copper metallization 47 planarization 47 electrodeposition 47 SOI CMOS 47 lithography 47 InP 47 2Xnm 47 Silicon Via TSV 47 gate dielectrics 47 #μm [001] 47 SiP 47 glass substrate 47 silicon etch 47 #.#μm CMOS process 47 submicron 47 wirebond 47 Alchimer 47 photomask 47 #nm CMOS [001] 46 millisecond anneal 46 CIGS PV 46 dielectrics 46 solder bump 46 silicon wafer 46 solder bumps 46 wafer dicing 46 deep sub micron 46 Novellus SABRE 46 imprint lithography 46 #nm #nm [005] 46 dual damascene 46 #nm/#nm 46 #nm silicon 46 #nm node [001] 46 nm DRAM 46 #/#nm 46 UMC #nm 46 line BEOL 46 ArF immersion lithography 46 wafer processing 46 GaAs 46 substrate 46 eutectic 46 silicon substrates 46 DongbuAnam 46 monolithically integrated 45 InGaAs 45 nanometer node 45 #.# micron node 45 sSOI 45 C4NP 45 InGaN 45 PHEMT 45 insulator wafers 45 #.# micron CMOS 45 mask aligners 45 SOI substrates 45 #μm thick [002] 45 X FAB 45 wafer probing 45 immersion litho 45 VCSELs 45 Gallium Nitride 45 semiconductor 45 amorphous silicon Si 45 MEMS resonators 45 optical lithography 45 underfill 45 high-k/metal gate 45 etching DRIE 45 #nm SOI 45 #nm [001] 45 k dielectrics 45 e beam lithography 45 #nm lithography [001] 45 AlN 45 SOI wafers 45 GaN 45 vertical cavity 45 Photolithography 45 AlGaN GaN 44 UV NIL 44 Schottky 44 pHEMT 44 photolithographic 44 SiC Schottky diodes 44 High Voltage CMOS 44 substrates 44 deep silicon etch 44 SiON 44 line FEOL 44 multilayers 44 DRIE 44 CMOS compatible 44 nonpolar GaN 44 AlGaN 44 #nm node [002] 44 k gate dielectrics 44 wafer 44 #nm CMOS [002] 44 nm CMOS 44 defectivity 44 micromachining 44 Laser VCSEL 44 HVPE 44 ASML TWINSCAN 44 rigid substrate 44 Carbon nanotube 44 micro machining 44 photoresist strip 44 monolithic microwave integrated 44 CMOS 44 CMOS wafer 44 deep submicron 44 temporary wafer bonding 44 nm lithography 43 Clear Shape 43 conformal 43 polycrystalline 43 CMOS fabrication 43 LTPS TFT 43 MEMS 43 EUVL 43 nanometer silicon 43 TSMC #nm process 43 passivation 43 nm node 43 laser micromachining 43 sub micron 43 silicon substrate 43 IC packaging 43 LiNbO3 43 vapor deposition 43 nm CMOS process 43 #nm immersion 43 low k dielectric 43 heterostructure 43 mechanical polishing CMP 43 photonic devices 43 SiGe bipolar 43 selective emitter 43 nm immersion 43 wafer bonder 43 laser welding 43 CMOS transistors 43 high-k/metal-gate 43 hydride vapor phase 43 singulation 43 HKMG 43 Jan Vardaman 43 nanoimprint lithography NIL 43 Novellus 43 VECTOR Express 43 JENOPTIK GmbH 43 silicon photonics 43 stencil printing 43 PIN diode 43 XT #i 43 epiwafers 43 CMP consumables 43 HfSiON 43 backside illumination 42 nanofilm 42 MOS transistor 42 CMOS transistor 42 LCOS 42 solution processible 42 metallisation 42 multichip 42 ZMD AG 42 thinner wafers 42 Vistec Semiconductor Systems 42 MOS transistors 42 crystalline silicon c 42 mm wafer 42 nitride semiconductor 42 flexible substrates 42 carbon nanotubes CNT 42 nano imprint 42 maskless 42 plasma etching 42 epitaxial layer 42 k gate dielectric 42 CoO 42 emitting laser VCSEL 42 optical coatings 42 TFPV 42 semiconducting nanowires 42 transparent conductive 42 1μm 42 BiCMOS 42 microelectronic 42 #nm RF CMOS 42 deep ultraviolet DUV 42 engineered substrates 42 epitaxial deposition 42 Plasmonic 42 mask aligner 42 sol gel 42 Esatto Technology 42 laser scribing 42 extreme ultraviolet lithography 42 #.#um [002] 42 microfluidic 42 low k dielectrics 42 nm SRAM 42 nanolithography 42 EUV masks 42 VCSEL 42 #mm fabs 42 nickel silicide 42 wafer probers 42 additive fabrication 42 nanosilicon 42 aluminum nitride 42 pMOS 42 subwavelength 42 nanoimprinting 42 #mm wafers 42 diode 42 maskless lithography 42 wafer thickness 42 CIGS cells 41 SiPs 41 k dielectric 41 parasitic extraction 41 Vertical Cavity Surface Emitting 41 CMOS logic 41 ellipsometry 41 SEMATECH 41 photodiode 41 CIGS solar cells 41 MESFET 41 nm nodes 41 Immersion Lithography 41 silicide 41 GenISys 41 #mm wafer 41 CMOS MEMS 41 mm wafers 41 high voltage BCDMOS 41 phototransistors 41 electron optics 41 Photoresist 41 SiGe C 41 semiconductor wafer 41 HKMG technology 41 photomask inspection 41 deep submicron CMOS 41 photomasks 41 Insulator SOI 41 leadframes 41 Aerosol Jet 41 SOI Silicon 41 defect densities 41 silicon germanium SiGe 41 electron beam welding 41 nanometer lithography 41 DFM DFY 41 Powerful debug 41 magnetron sputtering 41 micron 41 ferrite 41 EVG# 41 crystallinity 41 insulator substrate 41 bipolar transistors 41 Richard Brilla CNSE 41 computational lithography 41 ferroelectric random access 41 dielectric materials 41 IGBT Insulated Gate 41 electroformed 41 indium arsenide 41 Flex OneNAND 41 epitaxial structures 41 ZnSe 41 ownership CoO 41 MEMS foundry 41 gate electrode 41 Vistec Lithography 41 Structured ASICs 41 nanopatterning 41 #nm Buried Wordline 41 WiCkeD 41 tuner IC 41 smaller geometries 41 overlay metrology 41 SOI substrate 41 CMOS ICs 41 sputter deposition 40 thermal dissipation 40 silicon wafers 40 amorphous silicon 40 epi wafers 40 #.#μm CMOS 40 electromigration 40 silicon carbide 40 TiN 40 IQ Aligner 40 #nm nodes 40 CMOS processes 40 nano patterning 40 carbon nanotube CNT 40 MOCVD 40 geometries shrink 40 polyimide 40 SoC 40 nanometer scale 40 K dielectrics 40 wafer metrology 40 AMLCD 40 dielectric 40 HEMT 40 planar CMOS 40 semiconductor wafers 40 5μm 40 RRAM 40 backplanes 40 Maskless Lithography 40 Maskless 40 ECPR 40 HEMTs 40 transistor 40 photoresists 40 photodetector 40 poly silicon 40 density interconnect HDI 40 BCDMOS 40 BinOptics 40 PIN diodes 40 LPKF 40 electron mobility 40 nitride 40 Selete 40 GaAs gallium arsenide 40 sintering 40 copper electroplating 40 FDSOI 40 ATopTech 40 sapphire substrate 40 CIGS 40 manganite 40 Indium Phosphide 40 planar 40 optoelectronic 40 #mm silicon wafers 40 SOI silicon 40 nonpolar 40 Calibre LFD 40 nanometer 40 nanoimprint lithography 40 PEALD 40 electron beam lithography 40 NAND Flash 40 III nitride 40 nanometer nm 40 Gallium Arsenide GaAs 40 optical metrology 40 epitaxy HVPE 40 flexographic plates 40 oxide thickness 40 Strained silicon 40 Grätzel cells 40 reflow soldering 40 indium tin oxide ITO 40 RTL synthesis 40 nanometer CMOS 40 MEMS fabrication 40 GDSII 40 LayTec 40 flexo printing 40 silicon photonic 39 epiwafer 39 indium phosphide 39 Obducat 39 KrF 39 carbon nanotube 39 optical components 39 conformal coating 39 microdisplay 39 solder pastes 39 electroplating 39 indium gallium arsenide InGaAs 39 argon fluoride 39 virtual prototyping 39 Silicon Germanium 39 geometries 39 opto electronic 39 .# micron 39 Mask Aligner 39 SiGen 39 laser diode 39 Silicon CMOS Photonics 39 MEMS sensor 39 EBDW 39 EUV mask 39 micro optics 39 millimeter silicon wafers 39 CVD diamond 39 threshold voltages 39 oxide semiconductor 39 photodetectors 39 microfabrication techniques 39 antireflective coatings 39 UV LED 39 hafnium oxide 39 Invarium 39 semiconductor metrology 39 #nm HKMG 39 millimeter wafer 39 inkjet printing 39 XLR #i 39 design kits PDKs 39 film transistors TFTs 39 correction OPC 39 Altera FPGAs 39 CMOS wafers 39 chip SoCs 39 violet laser 39 SRAM DRAM 39 BIST 39 SEMVision G4 39 EUV 39 TSMC Hsinchu Taiwan 39 Thinfilm 39 PolyJet Matrix TM 39 electron beam 39 CMP slurries 39 c Si 39 NAND 39 sapphire wafers 39 Molecular Imprints 39 SiC substrates 39 PCB layout 39 lithographic processes 39 micro electromechanical systems 39 chipmakers 39 ArF 39 k1 39 SiGe 39 microchannel plate 39 bipolar transistor 39 optical waveguides 39 Vistec 39 semiconductor foundry 38 gallium nitride 38 silicon micromachining 38 Semicon 38 Focused Ion Beam 38 picosecond lasers 38 micromechanical 38 microcavities 38 thermoforming 38 BIOIDENT 38 optical interconnects 38 Phoseon Technology 38 CMOS circuits 38 EUV resist 38 metallic interconnects 38 Aera2 38 ReRAM 38 ITRS roadmap 38 AlN substrates 38 MAPPER 38 Spintronic 38 silicon CMOS 38 indium phosphide InP 38 Inovys 38 Scale Packaging 38 PVD CVD 38 X ray microscopy 38 SiO 2 38 ion implant 38 optoelectronic sensors 38 TFTs 38 surface passivation 38 Cadmium Telluride CdTe 38 #nm photomask 38 conductive adhesives 38 NovaScan 38 nm 38 nanoparticle inks 38 5V CMOS 38 fabs 38 Silicon Germanium SiGe 38 antifuse 38 Carl Zeiss SMT 38 transistor arrays 38 wafer fabs 38 Gallium Arsenide 38 LPCVD 38 dielectric layers 38 LTPS 38 litho 38 #nm wavelength [001] 38 graphene transistors 38 microfabrication 38 Imprio 38 Indium phosphide 38 ion beam 38 Santur Corporation 38 HamaTech APE 38 transistor scaling 38 silicon photovoltaics 38 Alanod Solar 38 semiconducting 38 DFEB 38 micrometer thick 38 silicon germanium 38 analog IC 38 GaN HEMT 38 FeRAM 38 nanoscale patterning 38 metal oxide 38 Therma Wave 38 femtosecond pulse 38 wide bandgap 38 etch deposition 38 Intermolecular 38 layer deposition ALD 37 Tokyo Electron Limited 37 RF CMOS 37 imec 37 #mm MEMS 37 IEDM 37 solder paste inspection 37 spintronic 37 HBLED 37 nonvolatile memories 37 GaAs substrate 37 Brion Technologies 37 furnaceware 37 projected capacitive touch 37 CMOS imager 37 crystalline silicon 37 planarity 37 solder paste 37 reflow 37 physical vapor deposition 37 PeakView 37 silicon foundries 37 PROLITH 37 nanoscale 37 brightness LED 37 discretes 37 AFMs 37 semiconductor fabrication 37 monochromator 37 darkfield 37 multijunction solar cells 37 FPGA prototyping 37 x ray optics 37 embedded nonvolatile memory 37 aspheric 37 crystalline Si 37 microelectromechanical system 37 micromachined 37 ArF immersion 37 gallium nitride GaN 37 parametric yield 37 manufacturability 37 CNT FED 37 etch 37 nanostructured surfaces 37 Toppan Photomasks 37 embedded NVM 37 Microfluidic 37 #nm geometries 37 wafer fabrication 37 nanometric 37 plasma etch 37 Scanning Probe Microscopy 37 nanopillar 37 MetaPULSE 37 metrology 37 ion implanters 37 barium titanate 37 nanocrystal 37 quantum dot lasers 37 UVision 37 printed circuit 37 mm fabs 37 extendibility 37 ion implantation 37 programmable logic devices 37 epitaxial graphene 37 lithography simulation 37 conductive inks 37 leadless 37 #nm lithography [002] 37 nano fabrication 37 pulsed laser deposition 37 numerical aperture 37 Negevtech 37 micromirror 37 optical interconnections 37 Chemical Mechanical Planarization 37 integrated circuits 37 Helios XP 37 IMEC 37 RFCMOS 37 zeolite membranes 37 EUV resists 36 reticle inspection 36 prototyping 36 CMOS scaling 36 VIISta 36 manufacturability DFM 36 Crolles2 36 scatterometry 36 anisotropic 36 uniaxial strain 36 microelectromechanical systems MEMS 36 UVTP 36 pellicle 36 ferromagnetic 36 carbon nanotube transistors 36 Extreme Ultraviolet EUV 36 CyberOptics 36 circuit MMIC 36 laser sintering 36 stereolithography 36 antireflection coating 36 VUV 36 STT RAM 36 #G DQPSK 36 photovoltaics PV 36 CMOS oscillators 36 #nm [002] 36 backside metallization 36 nanoindentation 36 AlGaAs 36 Cree GaN 36 lithographic techniques 36 indium gallium nitride InGaN 36 nanomechanical 36 antimonide 36 Nova NanoSEM 36 CMP slurry 36 Nanochip 36 reticle 36 MEMS oscillator 36 nanowires 36 semiconductor CMOS 36 NuFlare 36 SoC designs 36 printable electronics 36 RFIC 36 silicon transistors 36 TSMC 36 microfluidics 36 Double Patterning 36 Lithography 36 e beam DFEB 36 nanostructured materials 36 SUSS 36 CMOS silicon 36 IKONICS 36 nanophotonics 36 ITRS 36 chalcogenide 36 EUV Lithography 36 OLED displays 36 focused ion beam 36 crystalline silicon solar 36 FEOL cleaning 36 silicon nanocrystals 36 silicon MEMS 35 Extreme Ultra Violet 35 nanophotonic 35 nanoantenna 35 wave soldering 35 microbolometers 35 conductive coatings 35 QSC# 35 nanofabrication 35 flexo plates 35 MAX# integrates 35 ferroelectric 35 Inkjet printing 35 programmable chip SOPC 35 selective soldering 35 lithographic 35 Kovio 35 Gigaphoton 35 ASML 35 nanowire 35 semiconductors 35 reconfigurable computing 35 nanoscale characterization 35 UV inkjet 35 electrochemical 35 KLA Tencor 35 flexo 35 Applied Materials 35 microlithography 35 TWINSCAN XT #i 35 Nanoindentation 35 manufacturable 35 HTPS panels 35 reticle enhancement 35 DFB lasers 35 CMOS oscillator 35 transistor leakage 35 THz radiation 35 IDMs 35 Picolight 35 nm immersion lithography 35 antireflection 35 lamination 35 microstructures 35 voltage CMOS 35 numerical aperture NA 35 rotogravure printing 35 transistor circuits 35 Transistor 35 edge roughness LER 35 SPIE Advanced Lithography 35 nanofilms 35 chemical mechanical planarization 35 wafers 35 DDR2 DRAM 35 #nm transistors 35 extreme ultra violet 35 Solamet ® 35 semiconductor fabs 35 DPSS lasers 34 etcher 34 Aprio Technologies Inc. 34 photonics 34 SiTime 34 UV curing 34 micro fluidics 34 Luminescent Technologies 34 Timbre Technologies 34 glass substrates 34 Opti Probe 34 barium ferrite 34 isotropic 34 nanomanufacturing 34 SPICE simulator 34 optomechanical 34 Laurent Malier CEO 34 silicon chips 34 accuracy repeatability 34 perpendicular recording 34 Integrated Circuits 34 extreme ultraviolet EUV 34 fused quartz 34 mask optimization SMO 34 Spintronics 34 PZT 34 Tachyon SMO 34 SAW oscillators 34 chipmaking 34 Immersion lithography 34 International Sematech 34 microelectronic devices 34 gallium arsenide 34 rapid prototyping 34 annealing 34 LDMOS 34 wafering 34 discrete semiconductors 34 integrated metrology 34 Fractional N 34 TCZ 34 silicon DRIE 34 conformal coatings 34 nanotube 34 photonic integrated circuits 34 EDA tools 34 indium tin oxide 34 Mattson Technology 34 light emitting 34 chemically amplified 34 nanoelectronic 34 semiconductor nanostructures 34 Novellus Systems Inc NVLS.O 34 brightfield 34 chemical vapor deposition 34 PICMG specification 34 quantum dot 34 Photomask 34 Zenasis 34 VLSI Research 34 electron microscopy 33 patterning 33 Semiconductors ITRS 33 semiconductor lithography 33 transistors 33 linewidths 33 graphene 33 Terahertz 33 ion traps 33 VLSI 33 MALDI 33 programmable logic 33 FUJIFILM Dimatix 33 GaAs HBT 33 photonic crystal 33 reticles 33 inorganic semiconductors 33 scanning electron microscope SEM 33 silicon carbide SiC 33 HBLEDs 33 lenticular printing 33 scanning tunneling microscopy 33 silica spheres 33 transparent electrode 33 plasmonics 33 photon detection 33 diffraction 33 uniformity CDU 33 thermoelectric coolers 33 solar cells 33 photonic integration 33 photopolymer 33 inkjet inks 33 conductive ink 33 fiber lasers 33 semiconducting materials 33 phosphors 33 laser interferometer 33 passive ultrahigh frequency 33 photonic 33 Sokudo 33 coater developer 33 Dimatix 33 photolithographic techniques 33 evanescent wave 33 reconfigurable logic 33 optical microscopy 33 solder paste printing 33 organic photovoltaics 33 nanopositioning 33 bond aligner 32 ARPES 32 terahertz imaging 32 UHF EPC 32 Patterning 32 Raman lasers 32 nanometers 32 cytometry 32 photoluminescence 32 microengineering 32 #mm fab 32 foundry 32 Schmergel 32 logic CMOS 32 atomic spectroscopy 32 X ray metrology 32 chipless RFID 32 Sematech 32 DUV 32 metallic inks 32 UV inks 32 spectroscopic methods 32 systems substrate bonders 32 lithographic patterning 32 optical spectroscopy 32 Rapid prototyping 32 NSR S#C 32 double patterning lithography 32 quantum dots 32 optical 32 Photonic crystals 32 flexography 32 micro electro mechanical 32 Optomec Aerosol Jet 32 Anirudh Devgan general 32 Nanoimprint lithography 32 micromechanics 32 photopolymers 32 microcontact printing 32 nanostructured silicon 32 inkjet printhead 32 Encapsys 31 FlipChip 31 nanoarrays 31 UHF reader 31 microscopy 31 ultrahigh frequency UHF 31 HB LED 31 Beamline #.#.# 31 Stratasys FDM 31 etching 31 analog circuitry 31 RET OPC 31 Design Methodology 31 ArF dry 31 8bit MCUs 31 ASAT Holdings Ltd. 31 lithographers 31 wafer fab 31 outcoupling 31 photon fluorescence 31 deconvolution 30 nanoscale dimensions 30 crystallographic 30 superlens 30 electroluminescence 30 ultrahigh resolution 30 Kodak Versamark 30 nanoelectronics 30 interferometry 30 shrinking geometries 30 shorter wavelengths 30 mm fab 30 DuPont Photomasks 30 Raman spectroscopy 30 millimeter wafers 30 OLED 30 vibrational spectroscopy 30 dye sublimation 30 femtosecond 29 Bad Neuenahr 29 microscopy techniques 29 dimensional metrology 29 NOR flash memory 29 Kurt Ronse 29 nm wavelength 29 halftone 29 spectroscopy 29 X ray diffraction microscopy 29 analog circuits 29 JEOL 29 Ted Vucurevich 29 UV curable ink 29 scanning electron microscopes 29 femtosecond laser pulses 29 printhead 29 Three Dimensional 29 silicon crystallization 29 Tetra Reticle Clean 29 LCD steppers 29 photopolymer plates 29 presswork 29 helium ion 28 multiscale 28 Cymer 28 lithographic printing 28 Litho Forum 28 Signetics 28 ASML lithography 28 diffraction limit 28 Michal Lipson 28 nonvolatile memory 28 spectral imaging 28 monolithic IC 28 RapidIO ecosystem 28 ProFire Excel 27 microlasers 27 #nm ArF 27 serigraphy